Bibliografische Daten
ISBN/EAN: 9783709104231
Sprache: Englisch
Umfang: viii, 344 S., 180 s/w Illustr., 20 farbige Illustr
Einband: gebundenes Buch
Beschreibung
Inhaltsangabe1 Introduction.- Directions in Nanofabrication.- 2 Nanolithography.- Fundamentals of Electron Beam Exposure and Development.- Simulation of Electron Beam Exposure and Resist Processing for Nano-Patterning.- Helium Ion Lithography.- Nanoimprint Technologies.- 3 Deposition at the Nanoscale.- Atomic Layer Deposition for Nanotechnology.- Surface Functionalization in the Nanoscale Domain.- Nanostructures Based on Self-Assembly of Block Copolymers.- Epitaxial Growth of Metals on Semiconductors Via Electrodeposition.- 4 Nanoscale Etching and Patterning.- Chemical Mechanical Polish for Nanotechnology.- Deposition, Milling, and Etching with a Focused Helium Ion Beam.- Laser Nanopatterning.- Templating and Pattern Transfer Using Anodized Nanoporous Alumina/Titania.-
Inhalt
Introduction 1. Directions in Nanofabrication Nanolithography 2. Fundamentals of Electron Beam Exposure and Development 3. Simulation of electron beam exposure and resist processing for nano-patterning 4. Helium Ion Lithography 5. Nanoimprint Technologies Deposition at the nanoscale 6. Atomic layer deposition for nanotechnology applications 7. Surface Functionalization in the Nanoscale Domain 8. Nanostructures based on Self-Assembly of Block Copolymers 9. Glancing Angle Deposition (Jeremy Sit, University of Alberta) 10. Epitaxial Growth of Metals on Semiconductors via Electrodeposition Nanoscale etching and patterning 11. Chemical mechanical polish for ultra smooth surfaces 12. Ion beam etching and deposition (Paul Alkemade, TU Delft) 13. Templating and Pattern Transfer using Anodized Nanoporous Alumina/Titania 14. Etching and Pattern Transfer by Defocused Ion Beam Sputtering: Functional Modification of Nanostructured Substrates 15. Laser Nanopatterning